Optimization by central composite design (CCD)-response surface methodology (RSM) of the highly selective molecularly imprinted Ni and F co-doped TiO<subscript>2</subscript> photocatalyst for photocatalytic degradation of bisoprolol.

Molecularly imprinted Ni and F co-doped TiO 2 nanoparticles were synthesized via the sol–gel method. The nanoparticles displayed high photocatalytic activity under both sunlight and artificial visible light for degradation of bisoprolol. Characterization of the nanoparticles was carried out using XRD, FE-SEM, TEM, FT-IR, DRS, EDX and BET-BJH. The effects of different operational variables on the photocatalytic activity were optimized using the response surface methodology (RSM). The optimal experimental conditions for achieving the highest photocatalytic efficiency (72.5% by a desirability function value of 1.0) are as follows: pH = 5.9, photocatalyst mass = 83.42 mg, bisoprolol concentration = 16.2 mg L −1 , and irradiation time = 137 min. The selectivity of the photocatalyst was investigated against pantoprazole. The excellent photocatalytic activity is attributed to the doping of Ni and F dopants into the TiO 2 structure. The investigation of the mechanism of the photocatalytic reaction revealed that the main active species involved in the degradation of bisoprolol are OH˙ radicals. [ABSTRACT FROM AUTHOR]

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