Noble metal-free bimetallic phosphide-decorated Zn<subscript>0.5</subscript>Cd<subscript>0.5</subscript>S with efficient photocatalytic H<subscript>2</subscript> evolution.
In: Dalton Transactions: An International Journal of Inorganic Chemistry, Jg. 52 (2023-12-21), Heft 47, S. 17785-17791
academicJournal
Zugriff:
The rapid recombination of charge carriers in semiconductor-based photocatalysts results in a low photocatalytic activity. Co-catalysis is considered a promising strategy to improve the photocatalytic performance of semiconductors. In this study, a bimetallic phosphide was grown by a facile in situ growth method. Loading the cocatalyst (7 wt% NiCoP) leads to activity enhancement by a factor of approximately 27 times in the visible-light-driven hydrogen evolution relative to the pristine Zn 0.5 Cd 0.5 S. The photocatalysis shows a high hydrogen evolution rate of 19.5 mmol g −1 h −1 , which is much higher than that of the single metal phosphide (Ni 2 P: 7.0 mmol g −1 h −1 ; Co x P: 8.1 mmol g −1 h −1 ) and 7 wt% Pt modified Zn 0.5 Cd 0.5 S (0.3 mmol g −1 h −1 ). Its apparent quantum efficiency reaches 41.6% at 420 nm. Moreover, the photocatalyst exhibits a remarkable photostability for five consecutive cycles of photocatalytic activity measurements with a total reaction time of 15 hours. The excellent photocatalytic activity of the photocatalyst was attributed to the in situ-formed NiCoP cocatalyst, which not only acts as a reactive site but also accelerates the separation of charge carriers. [ABSTRACT FROM AUTHOR]
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Titel: |
Noble metal-free bimetallic phosphide-decorated Zn<subscript>0.5</subscript>Cd<subscript>0.5</subscript>S with efficient photocatalytic H<subscript>2</subscript> evolution.
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Autor/in / Beteiligte Person: | Chen, Lu ; Chen, Feng ; Xia, Yuzhou ; Liang, Ruowen ; Huang, Renkun ; Yan, Guiyang ; Ying, Shaoming |
Zeitschrift: | Dalton Transactions: An International Journal of Inorganic Chemistry, Jg. 52 (2023-12-21), Heft 47, S. 17785-17791 |
Veröffentlichung: | 2023 |
Medientyp: | academicJournal |
ISSN: | 1477-9226 (print) |
DOI: | 10.1039/d3dt03093h |
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