Improved EM Performance by Adjusting Etching Profile of Top Metal for 28HK Metal Gate Process
In: Conference of Science and Technology for Integrated Circuits (CSTIC); (2024-03-17) S. 1-2
Online
Konferenz
Zugriff:
Titel: |
Improved EM Performance by Adjusting Etching Profile of Top Metal for 28HK Metal Gate Process
|
---|---|
Autor/in / Beteiligte Person: | Cao, Zherui ; Zhao, Chunshan ; Zhang, Wuzhi ; Xu, Xiaolin ; Cao, Yamin |
Link: | |
Quelle: | Conference of Science and Technology for Integrated Circuits (CSTIC); (2024-03-17) S. 1-2 |
Veröffentlichung: | 2024 |
Medientyp: | Konferenz |
ISBN: | 979-8-3503-6219-0 (print) |
DOI: | 10.1109/CSTIC61820.2024.10531970 |
Sonstiges: |
|