Small-feature-size Etching of InP/InGaAsP by inductively coupled plasma at ultra-low pressure
In: Opto-Electronics and Communications Conference (OECC); (2012-07-01) S. 236-237
Online
Konferenz
Zugriff:
Titel: |
Small-feature-size Etching of InP/InGaAsP by inductively coupled plasma at ultra-low pressure
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Autor/in / Beteiligte Person: | Li, Yongzhuo ; Cui, Kaiyu ; Huang, Yidong ; Feng, Xue ; Wang, Da ; Zhang, Wei |
Link: | |
Quelle: | Opto-Electronics and Communications Conference (OECC); (2012-07-01) S. 236-237 |
Veröffentlichung: | 2012 |
Medientyp: | Konferenz |
ISBN: | 978-1-4673-0977-6 (print) ; 978-1-4673-0976-9 (print) ; 978-1-4673-0978-3 (print) |
ISSN: | 2166-8884 (print) ; 2166-8892 (print) |
DOI: | 10.1109/OECC.2012.6276458 |
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